ELECTRON PARAMAGNETIC RESONANCE STUDY ON SILICON GERMANIUM AND GALLIUM ARSENIDE SURFACES INTERACTING WITH ADSORBED OXYGEN

被引：27

作者：

CHAN, P

STEINEMA.A

机构：

来源：

SURFACE SCIENCE | 1966年 / 5卷 / 03期

关键词：

D O I：

10.1016/0039-6028(66)90027-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：267 / &

共 12 条

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[9] OXYGEN ADSORPTION ON SILICON SURFACES OBSERVED VIA ELECTRON SPIN RESONANCE [J].

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[10]

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