DEEP-LEVEL TRANSIENT SPECTROSCOPY OF DETECTOR-GRADE HIGH-RESISTIVITY FLOAT-ZONE SILICON

被引:5
|
作者
SIMOEN, E [1 ]
DEBACKKER, K [1 ]
CLAEYS, C [1 ]
CLAUWS, P [1 ]
机构
[1] LAB KRISTALLOG STUDIE VASTE STOF, B-9000 GHENT, BELGIUM
关键词
SI; DLTS; LOW DOPING DENSITY;
D O I
10.1007/BF02655621
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, the application of standard capacitance DLTS to high-resistivity (HR) silicon is investigated both theoretically and experimentally. As will be demonstrated, typical artefacts occur, which are related to the low doping density of the material (order of a few times 10(11) to 10(12) cm-3). The high series resistance of a HR-Si diode gives rise to the so-called Q-effect, yielding a reduction of the DLTS peak amplitude, which is particularly pronounced at room temperature and for p-type material. A second effect is the occurrence of non-negligible re-emission during the filling pulse, which causes the Arrhenius plot to deviate from a straight line and is particularly important for repulsive trapping centres. Methods will be discussed to reduce or correct for these phenomena. They will be illustrated by the practical example of the interstitial Fe donor-level in p-type HR-Si.
引用
收藏
页码:533 / 541
页数:9
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