SIMPLE CALCULATION OF THE HALL-COEFFICIENT OF THIN METAL-FILMS

被引:1
|
作者
TOSSER, AJ [1 ]
PICHARD, CR [1 ]
LAHRICHI, M [1 ]
BEDDA, M [1 ]
机构
[1] UNIV NANCY 1,PHYS DEPOTS MET LAB,F-54506 VANDOEUVRE NANCY,FRANCE
关键词
FILMS - Electric Properties - THERMAL EFFECTS;
D O I
10.1007/BF00720039
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Numerical evaluations of the Hall coefficient of thin metal films have shown that the Hall coefficient is proportional to the product of the film resistivity with its temperature coefficient. Such a simple equation suggests that an elementary physical point of view could be found for calculating the Hall coefficient. A simple calculation explored in the paper, based on the masked curvature of the electron path gives a general expression for the Hall coefficient in good agreement with previous separated studies; it has a general validity for homogeneous materials. Moreover a physical interpretation is thus given for the expression of the Hall coefficient in terms of the product of the resistivity with its temperature coefficient.
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页码:585 / 588
页数:4
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