DIRECT WRITE PHOTOMASKS

被引：0
|
作者：
SEGNER, J
LANGFELD, R
机构：
来源：
MASK TECHNOLOGY FOR MICROELECTRONIC COMPONENTS | 1989年 / 795卷
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：97 / 113
页数：17
相关论文
共 50 条
  • [1] ALL-GLASS MATERIAL FOR DIRECT-WRITE PHOTOMASKS
    LEVENSON, MD
    SOLID STATE TECHNOLOGY, 1994, 37 (09) : 28 - +
  • [2] Laser direct write patterned indium tin oxide films for photomasks and anisotropic resist applications
    Peng, J
    Chapman, G
    Tu, YQ
    PHOTONICS NORTH: APPLICATIONS OF PHOTONIC TECHNOLOGY 7B, PTS 1 AND 2: CLOSING THE GAP BETWEEN THEORY, DEVELOPMENT, AND APPLICATION - PHOTONIC APPLICATIONS IN ASTRONOMY, BIOMEDICINE, IMAGING, MATERIALS PROCESSING, AND EDUCATION, 2004, 5578 : 620 - 631
  • [3] Calibrating grayscale direct write bimetallic photomasks to create 3D photoresist structures
    Tu, YQ
    Chapman, G
    Dykes, J
    Poon, D
    Choo, CH
    Peng, J
    24TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PT 1 AND 2, 2004, 5567 : 245 - 256
  • [4] Laser-induced oxidation of zn and zn alloy films for direct-write grayscale photomasks
    Wang, Jun
    Chang, Marian
    Tu, Yuqiang
    Poon, David K.
    Chapman, Glenn H.
    Choo, Chinheng
    Peng, Jun
    PHOTON PROCESSING IN MICROELECTRONIC AND PHOTONICS V, 2006, 6106
  • [5] Creating direct-write gray-scale photomasks with bimetallic thin film thermal resists
    Chapman, G
    Tu, Y
    Dykes, J
    Mio, M
    Peng, J
    23RD ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2003, 5256 : 400 - 411
  • [6] Enhancing direct-write laser control techniques for bimetallic grayscale photomasks - art. no. 688312
    Dykes, James M.
    Plesa, Calin
    Chapman, Glenn H.
    ADVANCED FABRICATION TECHNOLOGIES FOR MICRO/NANO OPTICS AND PHOTONICS, 2008, 6883 : 88312 - 88312
  • [7] Real-time optical characterization of laser oxidation process in bimetallic direct write gray scale photomasks
    Poon, David K.
    Chapman, Glenn H.
    Choo, Chinheng
    Cheng, Marian
    Wang, Jun
    Tu, Yuqiang
    PHOTON PROCESSING IN MICROELECTRONIC AND PHOTONICS V, 2006, 6106
  • [8] Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks
    Chapman, GH
    Dykes, J
    Poon, D
    Choo, C
    Wang, J
    Peng, J
    Tu, YQ
    PHOTON PROCESSING IN MICROELECTRONICS AND PHOTONICS IV, 2005, 5713 : 247 - 258
  • [9] Direct write film
    Murray, Jerry
    Printed Circuit Fabrication, 1996, 19 (07): : 45 - 47
  • [10] Direct write patterning of microchannels
    Fries, C
    Fries, D
    Broadbent, H
    Steimle, G
    Kaltenbacher, E
    Sasserath, J
    FIRST INTERNATIONAL CONFERENCE ON MICROCHANNELS AND MINICHANNELS, 2003, : 787 - 794
12345