OXIDATION BEHAVIOR OF PD-SI COMPOUNDS

被引：31
|
作者：
CROS, A [1 ]
POLLAK, RA [1 ]
TU, KN [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
THIN SOLID FILMS | 1983年 / 104卷 / 1-2期
关键词：
D O I：
10.1016/0040-6090(83)90565-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：221 / 225
页数：5
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