共 50 条
- [1] ANNEALING OF ION-ALLOYED LAYERS BY ACTIVITY OF LASER-RADIATION USPEKHI FIZICHESKIKH NAUK, 1976, 120 (04): : 706 - 708
- [2] INFLUENCE OF PULSED LASER IRRADIATION ON THE PROPERTIES OF IMPLANTED LAYERS OF SILICON-CARBIDE SOVIET PHYSICS SEMICONDUCTORS-USSR, 1984, 18 (05): : 596 - 597
- [3] INFLUENCE OF SURFACE DISSOCIATION ON THE PROPERTIES OF ION-IMPLANTED P-TYPE LAYERS IN SILICON-CARBIDE SOVIET PHYSICS SEMICONDUCTORS-USSR, 1986, 20 (01): : 105 - 106
- [4] FORMATION OF SILICON-CARBIDE LAYERS BY THE ION-BEAM TECHNIQUE AND THEIR ELECTRICAL-PROPERTIES NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 39 (1-4): : 238 - 241
- [6] Preparation and characterization of micro-crystalline hydrogenated silicon carbide p-layers NCPV PHOTOVOLTAICS PROGRAM REVIEW: PROCEEDINGS OF THE 15TH CONFERENCE, 1999, 462 : 254 - 259
- [9] ELECTRICAL-PROPERTIES OF A P-N-N+ STRUCTURE FORMED IN SILICON-CARBIDE BY IMPLANTATION OF ALUMINUM IONS SOVIET PHYSICS SEMICONDUCTORS-USSR, 1987, 21 (09): : 1017 - 1020
- [10] ULTRASHORT LASER-PULSE EFFECT ON ELECTROPHYSICAL PROPERTIES OF SILICON-CARBIDE PISMA V ZHURNAL TEKHNICHESKOI FIZIKI, 1985, 11 (11): : 669 - 671