INCUBATION-TIME FOR HOLE FORMATION DUE TO ELECTROMIGRATION IN AL AND AL-CU-AL THIN-FILMS

被引：5
|
作者：
HOROWITZ, SJ [1 ]
BLECH, IA [1 ]
机构：
[1] TECHNION ISRAEL INST TECHNOL,DEPT MAT ENGN,HAIFA,ISRAEL
来源：
JOURNAL OF ELECTRONIC MATERIALS | 1975年 / 4卷 / 06期
关键词：
D O I：
10.1007/BF02660314
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：1171 / 1180
页数：10
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