QUANTUM-WELL GAAS/ALGAAS SHALLOW-DONOR FAR-INFRARED PHOTOCONDUCTORS GROWN BY MOLECULAR-BEAM EPITAXY

被引:15
|
作者
GOODHUE, WD [1 ]
MUELLER, ER [1 ]
LARSEN, DM [1 ]
WALDMAN, J [1 ]
CHAI, YH [1 ]
LAI, SC [1 ]
JOHNSON, GD [1 ]
机构
[1] UNIV MASSACHUSETTS,LOWELL,MA 01854
来源
关键词
D O I
10.1116/1.586746
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Photoconductors utilizing planar-doped silicon shallow donors in GaAs quantum wells formed with AlGaAs barriers have been fabricated and measured to have far-infrared (FIR) resonant-wavelength responsivities of approximately 1 V W-1, with noise equivalent power values of approximately 1 X 10(-7) W Hz-1/2 at 4 K. The technology makes possible the use of FIR photoconductive magnetospectroscopy to measure the well position of sheet-doped silicon ions when incorporated at doping levels below 1 X 10(16) CM-3. A comparison of the measured position of the ions with the intended position reveals a discrepancy that can be linked to the growth parameters used to produce the structure.
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页码:941 / 944
页数:4
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