INTERFACE STRESS AT ZNSE/GAAS-CR HETEROSTRUCTURE

被引：11
|
作者：
FUJIWARA, Y [1 ]
SHIRAKATA, S [1 ]
NISHINO, T [1 ]
HAMAKAWA, Y [1 ]
FUJITA, S [1 ]
机构：
[1] KYOTO UNIV,FAC ENGN,DEPT ELECT ENGN,SAKYO KU,KYOTO 606,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1986年 / 25卷 / 11期
关键词：
D O I：
10.1143/JJAP.25.1628
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1628 / 1632
页数：5
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