BIAS VOLTAGE INFLUENCE ON GUNN DIODE OSCILLATIONS STOCHASTIZATION IN MULTICIRCUIT OSCILLATORY SYSTEM

被引:0
|
作者
USANOV, DA
GORBATKOV, SS
SEMENOV, AA
机构
来源
RADIOTEKHNIKA I ELEKTRONIKA | 1991年 / 36卷 / 12期
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:2406 / 2409
页数:4
相关论文
共 9 条
  • [1] INFLUENCE OF IR RADIATION ON GUNN-DIODE OSCILLATIONS
    USANOV, DA
    GORBATOV, SS
    SKRIPAL, AV
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII RADIOELEKTRONIKA, 1982, 25 (10): : 92 - 93
  • [2] DEPENDENCE OF FREQUENCY OF A GUNN OSCILLATOR IN A LOW-Q RESONANCE SYSTEM ON BIAS VOLTAGE
    TSVIRKO, YA
    SUMMAR, VS
    RADIO ENGINEERING AND ELECTRONIC PHYSICS-USSR, 1970, 15 (11): : 2142 - &
  • [3] TEMPERATURE INFLUENCE ON WIDTH OF GUNN DIODE CURRENT-VOLTAGE CHARACTERISTICS ON EPITAXIAL-FILMS AND MONOCRYSTALS
    PROKHORO.ED
    SHALAEV, VA
    RADIOTEKHNIKA I ELEKTRONIKA, 1974, 19 (10): : 2209 - 2211
  • [4] Influence of the Coulomb interaction on the spin-polarized current in the quantum dot system in the presence of the bias voltage pulse
    Taranko, R.
    Parafiniuk, P.
    PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES, 2013, 49 : 5 - 12
  • [5] Influence of substrate bias voltage on structure and properties of Cr-Mo-Si-N coatings prepared by a hybrid coating system
    Hong, Seung Gyun
    Kwon, Se-Hun
    Kang, Sang-Won
    Kim, Kwang Ho
    SURFACE & COATINGS TECHNOLOGY, 2008, 203 (5-7): : 624 - 627
  • [6] Influence of bias voltage on microstructure and properties of Al-containing diamond-like carbon films deposited by a hybrid ion beam system
    Dai, Wei
    Ke, Peiling
    Wang, Aiying
    SURFACE & COATINGS TECHNOLOGY, 2013, 229 : 217 - 221
  • [7] Influence of negative bias voltage on structural and mechanical properties of nanocrystalline TiNX thin films treated in hot cathode arc discharge plasma system
    Singh, Omveer
    Malik, Hitendra K.
    Dahiya, Raj P.
    Kumar, Parmod
    CERAMICS INTERNATIONAL, 2016, 42 (16) : 18019 - 18024
  • [8] Influence of N2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system
    Wang, Qimin
    Park, In-Wook
    Kim, Kwangho
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2008, 26 (05): : 1188 - 1194
  • [9] Influence of substrate bias voltage on deposition behavior and microindentation hardness of Ti-Si-N coatings by a hybrid coating system of arc ion plating and sputtering techniques
    Choi, SR
    Park, IW
    Park, JH
    Kim, KH
    SURFACE & COATINGS TECHNOLOGY, 2004, 179 (01): : 89 - 94