HOLOGRAPHIC STUDY OF NON DESTRUCTIVE THERMAL-STRESS IN MULTIDIELECTRIC FILMS COATED FOR 10,6 MU-M

被引:0
|
作者
BAULAIGUE, P [1 ]
AUBERT, D [1 ]
BLANCHER, H [1 ]
OCCELLI, R [1 ]
MOYNAULT, JM [1 ]
机构
[1] FAC SCI & TECH ST JEROME,F-13397 MARSEILLE 20,FRANCE
来源
关键词
LASER DAMAGE; OPTICAL MATERIAL; STRESS;
D O I
10.1088/0150-536X/25/6/001
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We have developed a interferometric method, using holography, so that a thermal stress of a multidielectric coating deposited on glass subject to continuous laser flow at CO2 power can be observed in real time. This method is used with an image acquisition system so that computer processing of the observed fringes is possible.
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页码:225 / 229
页数:5
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