INVERSE PHOTOEMISSION FROM NI(100) AND NI(111) WITH ORIENTED OXYGEN OVERLAYERS

被引：24
作者：
DOSE, V
GLOBL, M
SCHEIDT, H
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期
关键词：
D O I：
10.1116/1.572346
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
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页码：1115 / 1118
页数：4
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