X-RAY-DIFFRACTION STUDY OF RELAXATION IN SI-SI(1-X)-GEX HETEROSTRUCTURES

被引：0
|
作者：
BARIBEAU, JM [1 ]
HOUGHTON, DC [1 ]
KECHANG, S [1 ]
机构：
[1] NATL RES COUNCIL CANADA,DIV PHYS,MICROSTRUCT SCI LAB,OTTAWA K1A 0R6,ONTARIO,CANADA
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1988年 / 135卷 / 11期
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D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：C538 / C538
页数：1
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