BACTERIA AS A PARTICLE SOURCE IN WAFER PROCESSING EQUIPMENT

被引：0
|
作者：
HARNED, W
机构：
来源：
JOURNAL OF ENVIRONMENTAL SCIENCES | 1986年 / 29卷 / 03期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：32 / 34
页数：3
相关论文
共 50 条
  • [1] Perfluoroelastomer and fluoroelastomer seals for semiconductor wafer processing equipment
    Wang, SH
    Legare, JM
    JOURNAL OF FLUORINE CHEMISTRY, 2003, 122 (01) : 113 - 119
  • [2] Extending particle characterization limits in wafer processing
    C. R. Brundle and Associates
    MICRO, 7 (8pp):
  • [3] Extending particle characterization limits in wafer processing
    Brundle, D
    Brundle, CR
    Uritsky, Y
    Pan, JT
    MICRO, 1995, 13 (07): : 43 - &
  • [4] Perfluoroelastomer and fluoroelastomer seals for semiconductor wafer processing equipment.
    Wang, SH
    Legare, JM
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2002, 224 : U548 - U549
  • [5] Wafer equipment
    Research & Development (Barrington, Illinois), 1995, 37 (05):
  • [6] PARTICLE MONITORING AND CONTROL IN VACUUM PROCESSING EQUIPMENT
    BORDEN, PG
    GREGG, J
    VACUUM MECHATRONICS, 1989, 192 : 6 - 11
  • [7] MULTISTEP, INSITU SINGLE WAFER PROCESSING - MATERIALS, DEVICE AND EQUIPMENT ISSUES
    HAUSER, JR
    MASNARI, NA
    LITTLEJOHN, MA
    RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING, 1989, 146 : 15 - 26
  • [8] Identification and sizing of particle defects in semiconductor-wafer processing
    Yoo, SH
    Weygand, J
    Scherer, J
    Davis, L
    Liu, B
    Christenson, K
    Butterbaugh, J
    Narayanswami, N
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (02): : 344 - 353
  • [9] IDENTIFICATION OF THE PARTICLE SOURCE IN LSI MANUFACTURING PROCESS EQUIPMENT
    TAKII, Y
    AOI, N
    HIROFUJI, Y
    IEICE TRANSACTIONS ON ELECTRONICS, 1994, E77C (03) : 486 - 491
  • [10] Use of particle methods to design mineral processing equipment
    Cleary, P.W.
    Barton, N.G.
    Zeitschrift fuer Angewandte Mathematik und Mechanik, ZAMM, Applied Mathematics and Mechanics, 1996, 76 (Suppl 4):
12345