MECHANISM OF GROWTH OF ULTRATHIN SIO2 LAYERS ON SILICIDE SUBSTRATES

被引：6
|
作者：
CROS, A
机构：
来源：
SURFACE SCIENCE | 1985年 / 162卷 / 1-3期
关键词：
D O I：
10.1016/0039-6028(85)90969-0
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
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页码：702 / 707
页数：6
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