INTERFACIAL COUPLING BETWEEN A MAGNETIC THIN-FILM AND A NORMAL METAL

被引：11
|
作者：
HURDEQUINT, H
DUNIFER, G
机构：
[1] UNIV PARIS 11,PHYS SOLIDES LAB,F-91405 ORSAY,FRANCE
[2] WAYNE STATE UNIV,DEPT PHYS,DETROIT,MI 48202
来源：
JOURNAL DE PHYSIQUE | 1988年 / 49卷 / C-8期
关键词：
D O I：
10.1051/jphyscol:19888780
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：1717 / 1718
页数：2
相关论文
共 50 条
  • [1] Theory of magnetostatic coupling in thin-film rectangular magnetic elements
    Tsymbal, EY
    APPLIED PHYSICS LETTERS, 2000, 77 (17) : 2740 - 2742
  • [2] Thin-Film Coupling Membrane
    Ginzel, Ed
    MacNeil, Rick
    Molina, Mauricio
    e-Journal of Nondestructive Testing, 2023, 28 (04):
  • [3] EXCHANGE COUPLING BETWEEN A SOFT AND A HARD FERROMAGNETIC THIN-FILM
    OUNADJELA, K
    SURAN, G
    JOURNAL OF APPLIED PHYSICS, 1988, 63 (08) : 3244 - 3246
  • [4] INTERFACIAL REACTIONS BETWEEN RHODIUM AND GAAS IN BULK AND THIN-FILM FORM
    SCHULZ, KJ
    CHANG, YA
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1992, 12 (03): : 223 - 235
  • [5] Thin-Film Metal Hydrides
    Remhof, Arndt
    Borgschulte, Andreas
    CHEMPHYSCHEM, 2008, 9 (17) : 2440 - 2455
  • [6] METAL THIN-FILM RESISTORS
    KANEOYA, R
    ELECTRONICS & COMMUNICATIONS IN JAPAN, 1966, 49 (04): : 70 - &
  • [7] FRICTION, WEAR, AND INTERFACIAL CHEMISTRY IN THIN-FILM MAGNETIC RIGID DISK FILES
    DUGGER, MT
    CHUNG, YW
    BHUSHAN, B
    ROTHSCHILD, W
    JOURNAL OF TRIBOLOGY-TRANSACTIONS OF THE ASME, 1990, 112 (02): : 238 - 245
  • [8] COUPLING CHARACTERISTICS OF THIN-FILM METAL-OXIDE-METAL DIODES AT 10.6 MUM
    WANG, SY
    IZAWA, T
    GUSTAFSON, TK
    APPLIED PHYSICS LETTERS, 1975, 27 (09) : 481 - 483
  • [9] MAGNETIC THIN-FILM DEVICES
    GAU, JS
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 1989, 3 (04): : 377 - 381
  • [10] THIN-FILM MAGNETIC HEAD
    MURAMATSU, T
    KIRA, T
    MIYAMOTO, A
    SASADA, T
    SHARP TECHNICAL JOURNAL, 1993, (55): : 5 - 11
12345