SEGREGATION OF SILICON IN GALLIUM PHOSPHIDE

被引：0
|
作者：
RUBENSTEIN, M
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1962年 / 109卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C208 / C208
页数：1
相关论文
共 50 条
  • [1] SEGREGATION OF SILICON IN GALLIUM PHOSPHIDE
    RUBENSTEIN, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (10) : 1010 - +
  • [2] Epitaxial Layers of Gallium Phosphide on Silicon
    Noack, J.
    Moehling, W.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 1970, 3 (04): : K229 - K231
  • [3] INFLUENCE OF SILICON ON LUMINESCENCE OF GALLIUM PHOSPHIDE
    BASETSKII, VY
    GORYUNOV.NA
    PESKOV, OG
    KHOLUYAN.GF
    SOVIET PHYSICS SEMICONDUCTORS-USSR, 1968, 2 (01): : 101 - +
  • [4] SPECTROPHOTOMETRIC DETERMINATION OF SILICON IN GALLIUM PHOSPHIDE
    LUKE, CL
    ANALYTICAL CHEMISTRY, 1964, 36 (10) : 2036 - &
  • [5] Solar Cells with Gallium Phosphide / Silicon Heterojunction
    Darnon, Maxime
    Varache, Renaud
    Descazeaux, Mederic
    Quinci, Thomas
    Martin, Mickael
    Baron, Thierry
    Munoz, Delfina
    11TH INTERNATIONAL CONFERENCE ON CONCENTRATOR PHOTOVOLTAIC SYSTEMS (CPV-11), 2015, 1679
  • [6] Diffusion of Phosphorus and Gallium from a Deposited Layer of Gallium Phosphide into Silicon
    Zikrillaev, N. F.
    Koveshnikov, S. V.
    Turekeev, Kh. S.
    Norkulov, N.
    Tachilin, S. A.
    PHYSICS OF THE SOLID STATE, 2022, 64 (11) : 587 - 594
  • [7] Diffusion of Phosphorus and Gallium from a Deposited Layer of Gallium Phosphide into Silicon
    N. F. Zikrillaev
    S. V. Koveshnikov
    Kh. S. Turekeev
    N. Norkulov
    S. A. Tachilin
    Physics of the Solid State, 2022, 64 : 587 - 594
  • [8] Gallium Phosphide-on-Silicon Dioxide Photonic Devices
    Schneider, Katharina
    Welter, Pol
    Baumgartner, Yannick
    Hahn, Herwig
    Czornomaz, Lukas
    Seidler, Paul
    JOURNAL OF LIGHTWAVE TECHNOLOGY, 2018, 36 (14) : 2994 - 3002
  • [9] STABILITY OF OXYGEN IMPURITY IN SILICON AND GALLIUM-PHOSPHIDE
    JAROS, M
    JOURNAL OF PHYSICS C-SOLID STATE PHYSICS, 1983, 16 (14): : L459 - L463
  • [10] Gallium Phosphide Window Layer for Silicon Solar Cells
    Feifel, Markus
    Rachow, Thomas
    Benick, Jan
    Ohlmann, Jens
    Janz, Stefan
    Hermle, Martin
    Dimroth, Frank
    Lackner, David
    IEEE JOURNAL OF PHOTOVOLTAICS, 2016, 6 (01): : 384 - 390
12345