A NEW VERTICAL DOUBLE DIFFUSED MOSFET - THE SELF-ALIGNED TERRACED-GATE MOSFET

被引:22
|
作者
UEDA, D
TAKAGI, H
KANO, G
机构
关键词
D O I
10.1109/T-ED.1984.21543
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:416 / 420
页数:5
相关论文
共 50 条
  • [1] FinFET - A self-aligned double-gate MOSFET scalable to 20 nm
    Hisamoto, D
    Lee, WC
    Kedzierski, J
    Takeuchi, H
    Asano, K
    Kuo, C
    Anderson, E
    King, TJ
    Bokor, J
    Hu, CM
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 2000, 47 (12) : 2320 - 2325
  • [2] On the Quasi-Saturation Behavior of a Novel Vertical Power MOSFET with Self-Aligned Gate
    Cai, W. Z.
    Gogoi, B. P.
    Davies, R. B.
    Lutz, D.
    2010 22ND INTERNATIONAL SYMPOSIUM ON POWER SEMICONDUCTOR DEVICES AND ICS (ISPSD), 2010, : 197 - 199
  • [3] Self-aligned vertical double-gate MOSFET (VDGM) with the oblique rotating ion implantation (ORI) method
    Saad, Ismail
    Ismail, Razali
    MICROELECTRONICS JOURNAL, 2008, 39 (12) : 1538 - 1541
  • [4] ION-IMPLANTED SELF-ALIGNED MO GATE MOSFET
    SAITO, K
    ELECTRONICS & COMMUNICATIONS IN JAPAN, 1977, 60 (09): : 85 - 92
  • [5] A METAL-GATE SELF-ALIGNED MOSFET USING NITRIDE OXIDE
    SCHMIDT, MA
    RAFFEL, JI
    TERRY, FL
    SENTURIA, SD
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1985, 32 (03) : 643 - 648
  • [6] Design considerations of the sub-50nm self-aligned double gate MOSFET with a new channel doping profile
    Yin, HX
    Xu, QX
    SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS, 2001, : 535 - 538
  • [7] Self-aligned (top and bottom) double-gate MOSFET with a 25 nm thick silicon channel
    Wong, HSP
    Chan, KK
    Taur, Y
    INTERNATIONAL ELECTRON DEVICES MEETING - 1997, TECHNICAL DIGEST, 1997, : 427 - 430
  • [8] Structure design considerations of a sub-50 nm self-aligned double-gate MOSFET
    Yin, Huaxiang
    Xu, Qiuxia
    Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2002, 23 (12): : 1267 - 1274
  • [9] Gate Last MOSFET with Air Spacer and Self-Aligned Contacts for Dense Memories
    Park, Jemin
    Hu, Chenming
    PROCEEDINGS OF TECHNICAL PROGRAM: 2009 INTERNATIONAL SYMPOSIUM ON VLSI TECHNOLOGY, SYSTEMS AND APPLICATIONS, 2009, : 105 - 106
  • [10] METAL-GATE SELF-ALIGNED MOSFET USING NITRIDE OXIDE.
    Schmidt, Martin A.
    Raffel, Jack I.
    Terry, Fred L.
    Senturia, Stephen D.
    IEEE Transactions on Electron Devices, 1985, ED-32 (03) : 643 - 648