MODELING DELAMINATION DUE TO THERMAL-STRESS IN OPTICAL STORAGE MEDIA

被引：2
|
作者：
NKANSAH, MA
EVANS, KE
机构：
[1] Department of Materials Science and Engineering, University of Liverpool, Liverpool L69 3BX
来源：
JOURNAL OF APPLIED PHYSICS | 1990年 / 67卷 / 07期
关键词：
D O I：
10.1063/1.345356
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Finite element analysis is used to calculate the shape of blisters formed in bilayer optical storage media due to the buildup of thermal stresses during laser writing. It is shown that practically usable blisters may be expected to form in a time period of about 15 ns. Such a thermal stress delamination process may also precede melting in conventional pit formation processes.
引用
收藏
页码：3243 / 3248
页数：6
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