LASER-INDUCED THERMAL-DESORPTION OF ANILINE FROM SILICA SURFACES

被引:27
|
作者
VOUMARD, P
ZENOBI, R
机构
[1] ETH ZENTRUM, LOC, CH-8092 ZURICH, SWITZERLAND
[2] ECOLE POLYTECH FED LAUSANNE, LPAS, CH-1015 LAUSANNE, SWITZERLAND
来源
JOURNAL OF CHEMICAL PHYSICS | 1995年 / 103卷 / 15期
关键词
D O I
10.1063/1.470358
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A complete study on the energy partitioning upon laser-induced thermal desorption of aniline from silica surfaces was undertaken. The measurements include characterization of the aniline-quartz adsorption system using temperature-programmed desorption, the extrapolation of quasiequilibrium desorption temperatures to the regime of laser heating rates on the order of 10(9)-10(10) K/s by computational means, measurement of the kinetic energy distributions of desorbing aniline using a pump-probe method, and the determination of internal energies with resonance-enhanced multiphoton ionization spectroscopy. The measurements are compared to calculations of the surface temperature rise and the resulting desorption rates, based on a finite-difference mathematical description of pulsed laser heating. While the surface temperature of laser-heated silica reaches about 600-700 K at the time of desorption, the translational temperature of laser-desorbed aniline was measured to be T-kin=420+/-60 K, T-vib was 360+/-60 K, and T-rot was 350+/-100 K. These results are discussed using different models for laser-induced thermal desorption from surfaces. (C) 1995 American institute of Physics.
引用
收藏
页码:6795 / 6805
页数:11
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