EFFECTS OF ALUMINUM ELECTRODE AND HYDROGEN GAS DURING HEAT TREATMENTS ON MOS STRUCTURE

被引：4
|
作者：
TOKUTAKA, H
KUBO, S
AKIYAMA, K
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1966年 / 5卷 / 09期
关键词：
D O I：
10.1143/JJAP.5.841
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：841 / &
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