BARRIER LOWERING AND FIELD PENETRATION AT METAL-DIELECTRIC INTERFACES - (AL-SI02 - MOS STRUCTURES - E)

被引：39

作者：

MEAD, CA

SNOW, EH

DEAL, BE

机构：

来源：

关键词：

D O I：

10.1063/1.1754598

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：53 / &

共 9 条

[1]

BERGLUND CN, 1964, PHYS REV A-GEN PHYS, V136, P1030

[2]

BRAUNSTEIN, 1966, APPL PHYS LETTERS, V8, P95

[3]

DEAL BE, TO BE PUBLISHED

[4]

GOBELI GW, 1965, PHYS REV, V137, pA425

[5]

LEWICKI, 1966, APPL PHYS LETT, V8, P98

[6] ELECTRIC FIELD PENETRATION INTO METALS [J].

MACDONALD, JR .

[7]

MOTT NF, 1958, METALS ALLOYS, P87

SIMMONS, JG .

PHYSICS LETTERS, 1965, 16 (03) :233-&

SZE, SM ;

CROWELL, CR ;

KAHNG, D .