IMPROVED PERFORMANCE OF INSE-BASED PHOTOELECTROCHEMICAL CELLS BY MEANS OF A SELECTIVE (PHOTO)ELECTROCHEMICAL ETCHING

被引：34
|
作者：
TENNE, R [1 ]
THEYS, B [1 ]
RIOUX, J [1 ]
LEVYCLEMENT, C [1 ]
机构：
[1] CNRS,PHYS SOLIDE LAB,1 PLACE ARISTIDE BRIAND,F-92190 MEUDON,FRANCE
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 01期
关键词：
D O I：
10.1063/1.335377
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：141 / 145
页数：5
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