TUNNELLING IN SEMICONDUCTORS

被引：0
|
作者：
ESAKI, L [1 ]
机构：
[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598
来源：
CESKOSLOVENSKY CASOPIS PRO FYSIKU SEKCE A | 1974年 / 24卷 / 06期
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D O I：
暂无
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
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页码：537 / 551
页数：15
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