INSITU OBSERVATIONS OF SHAPE EVOLUTION DURING COPPER DISSOLUTION USING ATOMIC FORCE MICROSCOPY

被引:53
|
作者
CRUICKSHANK, BJ
GEWIRTH, AA
RYNDERS, RM
ALKIRE, RC
机构
[1] Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana
关键词
D O I
10.1149/1.2068988
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Atomic force microscopy was used to monitor, in situ, the shape evolution of polycrystalline copper during anodic dissolution in 0.5M H2SO4. During dissolution of the copper surface under a small anodic potential (30 mV), an overlayer of material that resulted from mechanical polishing was removed, exposing the underlying grain boundaries. A chemically etched sample was exposed to the same experimental conditions, and no overlayer was observed. Dissolution of the copper bulk metal was monitored under a higher applied potential (100 mV, 0.5M H2SO4). The overlayer was immediately removed, and the dissolution produced a nonuniform, crystallographically-etched surface. The inhibiting effect of benzotriazole (BTA) on copper dissolution in 0.5M H2SO4/20 mM BTA was observed. Copper dissolution did not proceed at 100 mV or 200 mV applied potential; but at 300 mV, rapid localized dissolution resulted in the formation of pit-like features.
引用
收藏
页码:2829 / 2832
页数:4
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