THICKNESS DEPENDENCE OF ETCHING RATE IN DRY PHOTOETCHING OF ORGANIC RESISTS

被引：9
|
作者：
UENO, N
SUGITA, K
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1986年 / 25卷 / 09期
关键词：
D O I：
10.1143/JJAP.25.1455
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1455 / 1456
页数：2
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