Phase-controllable large-area two-dimensional In2Se3 and ferroelectric heterophase junction

被引:0
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作者
Wei Han
Xiaodong Zheng
Ke Yang
Chi Shing Tsang
Fangyuan Zheng
Lok Wing Wong
Ka Hei Lai
Tiefeng Yang
Qi Wei
Mingjie Li
Weng Fu Io
Feng Guo
Yuan Cai
Ning Wang
Jianhua Hao
Shu Ping Lau
Chun-Sing Lee
Thuc Hue Ly
Ming Yang
Jiong Zhao
机构
[1] The Hong Kong Polytechnic University,Department of Applied Physics
[2] The Hong Kong Polytechnic University Shenzhen Research Institute,Department of Computing
[3] The Hong Kong Polytechnic University,Department of Chemistry and Center of Super
[4] City University of Hong Kong,Diamond & Advanced Films (COSDAF)
[5] City University of Hong Kong,Department of Physics
[6] Shenzhen Research Institute,Hubei Yangtze Memory Laboratories
[7] Hong Kong University of Science and Technology,undefined
[8] Hubei University,undefined
来源
Nature Nanotechnology | 2023年 / 18卷
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摘要
Memory transistors based on two-dimensional (2D) ferroelectric semiconductors are intriguing for next-generation in-memory computing. To date, several 2D ferroelectric materials have been unveiled, among which 2D In2Se3 is the most promising, as all the paraelectric (β), ferroelectric (α) and antiferroelectric (β′) phases are found in 2D quintuple layers. However, the large-scale synthesis of 2D In2Se3 films with the desired phase is still absent, and the stability for each phase remains obscure. Here we show the successful growth of centimetre-scale 2D β-In2Se3 film by chemical vapour deposition including distinct centimetre-scale 2D β′-In2Se3 film by an InSe precursor. We also demonstrate that as-grown 2D β′-In2Se3 films on mica substrates can be delaminated or transferred onto flexible or uneven substrates, yielding α-In2Se3 films through a complete phase transition. Thus, a full spectrum of paraelectric, ferroelectric and antiferroelectric 2D films can be readily obtained by means of the correlated polymorphism in 2D In2Se3, enabling 2D memory transistors with high electron mobility, and polarizable β′–α In2Se3 heterophase junctions with improved non-volatile memory performance.
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页码:55 / 63
页数:8
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