Retraction Note: Large-Area Semiconducting Graphene Nanomesh Tailored by Interferometric Lithography

被引：0
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作者：
Alireza Kazemi
Xiang He
Seyedhamidreza Alaie
Javad Ghasemi
Noel Mayur Dawson
Francesca Cavallo
Terefe G. Habteyes
Steven R. J. Brueck
Sanjay Krishna
机构：
[1] University of New Mexico,Center for High Technology Materials
[2] University of New Mexico,Department of Mechanical Engineering
[3] University of New Mexico,Nanoscience and Microsystems Engineering
来源：
Scientific Reports | / 11卷
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摘要：
Editor's Note: this Article has been retracted; the Retraction Note is available at https://doi.org/10.1038/s41598-021-84101-3.
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