Fabrication of improved-quality seed crystals for growth of bulk silicon carbide

Sublimation epitaxy in a vacuum has been used to grow silicon carbide layers with a low defect concentration and with SiC wafers cut from single-crystal ingots produced by the modified Lely method serving as substrates. It is concluded on the basis of a comparative study of the distribution of structural defects in substrates and epitaxial layers that an isomorphic pair composed of an epitaxial layer and a single-crystal SiC substrate, which is a composite of materials produced by the same method (sublimation synthesis), but in different technological conditions, is promising for fabrication of improved-quality silicon carbide seed crystals.