A pulse-type evaporator for ultrafast deposition of thin films in ultrahigh vacuum

被引：0
|
作者：
A. S. Gouralnik
N. G. Galkin
V. A. Ivanov
M. V. Ivanchenko
E. A. Chusovitin
机构：
[1] Russian Academy of Sciences,Institute of Automation and Control Processes, Far East Branch
[2] Far East State University,Faculty of Physics and Technology
来源：
Instruments and Experimental Techniques | 2007年 / 50卷
关键词：
81.05.Zx; 81.15.-z; 81.15.Ef;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The design of a simple pulse-type evaporator ensuring a high rate (up to ∼104 nm/s) of deposition of thin films (0.01–100 nm thick) onto a solid surface in ultrahigh vacuum is described. The evaporation pulse is created by discharge of a capacitor bank via a fast-response evaporator produced from a tungsten foil. Results illustrating the efficiency of this device are presented.
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页码：408 / 410
页数：2
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