Formation of misfit edge dislocations in GexSi1 − x films (x ∼ 0.4–0.5) grown on tilted Si(001) → (111) substrates

The dislocation structure of GexSi1 − x films (x ∼ 0.4–0.5) grown by molecular epitaxy on Si(001) substrates tilted by 6° about the 〈011〉 axis was studied. It is shown that, in the tilt direction, edge misfit dislocations (MDs) arise only in the form of short segments lying on the intersections of 60° MDs. As a result, the total length of edge MDs along the substrate tilt direction is smaller than that along the tilt axis. The deviation of the substrate surface from the singular plane made it possible to detect a dislocation configuration that consists of a short segment of an edge MD and two diverging 60° MDs propagating from it in the tilt direction. The formation of the segment is assumed to begin with simultaneous nucleation of complementary dislocation half-loops that form a short edge MD on the interface and then propagate on one side as two diverging 60° MD lines.