Analytical characterization of thin carbon films

被引：0

作者：

R. Ohr

C. Schug

M. Wahl

A. Wienss

H. Hilgers

J. Mahrholz

P. Willich

T. Jung

机构：

[1] IBM Deutschland Speichersysteme GmbH,

[2] Hechtsheimer Str. 2,undefined

[3] 55131 Mainz,undefined

[4] Germany,undefined

[5] Fraunhofer Institut für Schicht- und Oberflächentechnik,undefined

[6] Bienroder Weg 54E,undefined

[7] 38108 Braunschweig,undefined

[8] Germany,undefined

来源：

Analytical and Bioanalytical Chemistry | 2003年 / 375卷

关键词：

Thickness determination Carbon overcoat X-ray reflectivity (XRR) Thin-film analysis Areal storage density;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

CHx films on silicon substrates deposited by a Mesh Hollow Cathode Process (MHC) were analyzed by various techniques. The films were produced with varying deposition times, resulting in thicknesses ranging from ~2–20 nm. X-Ray Reflectivity (XRR) was used to determine the film thicknesses and the deposition rate. A good correlation of measured XRR thicknesses with SIMS sputter depths down to the film–substrate transition was found.

引用

页码：47 / 52

页数：5

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