Phase-field method;
Finite element method;
Wettability;
Heterogeneous surface;
Droplet impingement;
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摘要:
A numerical investigation on the impingement and spreading of a micro-sized droplet with nonzero impact velocities on a surface with heterogeneous wettability is presented in this paper. The numerical model was implemented through phase-field simulation with finite element formulation. A simple scheme based on interfacial phase-field function gradient was proposed to track the velocity of contact line which was required to specify the dynamic contact angle based on hydrodynamic theory and molecular kinetic approach. For a circular pattern with a higher wettability than the surrounding surface, the impinging droplet final spread diameter decreases with an increasing wettability contrast. The droplet conforms to the circular patterns with smaller diameters up to a threshold, which is dictated by the wettability of the surface surrounding the pattern. Impact velocity of the droplet affects the maximum spread diameter but not the final conformability to a wettability pattern. Impingement and anisotropic spreading of a droplet on a stripe pattern was also demonstrated in a three-dimensional simulation. The high wettability contrast between the inner and outer regions of the stripe pattern confines droplet spreading and elongates the droplet in the direction of the stripe. These simulations demonstrated the conditions for a jetted micro-sized droplet to be confined to a specific area through wettability patterning, which can potentially improve the precision of current inkjet printing technology.
机构:
Beijing Inst Technol, Sch Aerosp Engn, Beijing 100081, Peoples R ChinaBeijing Inst Technol, Sch Aerosp Engn, Beijing 100081, Peoples R China
Wang, Bo
Wang, Chenyu
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机构:
Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R ChinaBeijing Inst Technol, Sch Aerosp Engn, Beijing 100081, Peoples R China
Wang, Chenyu
Yu, Yude
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机构:
Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China
Univ Chinese Acad Sci, Coll Mat Sci & Optoelect Technol, Beijing 100049, Peoples R ChinaBeijing Inst Technol, Sch Aerosp Engn, Beijing 100081, Peoples R China
Yu, Yude
Chen, Xiaodong
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机构:
Beijing Inst Technol, Sch Aerosp Engn, Beijing 100081, Peoples R ChinaBeijing Inst Technol, Sch Aerosp Engn, Beijing 100081, Peoples R China
机构:
Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
Grace Semicond Manufacture Corp, Shanghai 201203, Peoples R China
Chinese Acad Sci, Grad Sch, Beijing 100039, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
Sun Zhen-Hai
Han Rui-Jing
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机构:
Grace Semicond Manufacture Corp, Shanghai 201203, Peoples R ChinaChinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, Shanghai 200050, Peoples R China
机构:
Tongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R ChinaTongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China
Zhao, Jiayi
Chen, Shuo
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机构:
Tongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China
Tongji Univ, Shanghai Key Lab Vehicle Aerodynam & Vehicle Ther, Shanghai 201804, Peoples R ChinaTongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China
Chen, Shuo
Liu, Yang
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机构:
Hong Kong Polytech Univ, Dept Mech Engn, Kowloon, Hong Kong, Peoples R ChinaTongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China