Contactless processing of SiGe-melts in EML under reduced gravity

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作者
Yuansu Luo
Bernd Damaschke
Stephan Schneider
Georg Lohöfer
Nikolay Abrosimov
Matthias Czupalla
Konrad Samwer
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[1] Georg-August-Universität,I. Physikalisches Institut
[2] Deutsches Zentrum für Luft- und Raumfahrt (DLR),Institut für Materialphysik im Weltraum
[3] Leibniz Institute for Crystal Growth,undefined
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The processing of semiconductors based on electromagnetic levitation is a challenge, because this kind of materials shows a poor electrical conductivity. Here, we report the results of measurements of the thermophysical properties obtained recently from highly doped semiconductors Si1−xGex under microgravity conditions in the framework of parabola flight campaigns. Due to the limited time of about 20 s of microgravity especially Ge-rich samples with low melting temperatures were investigated. The measurements were performed contactlessly by video techniques with subsequent digital image processing. Linear and volume thermal expansion coefficients were measured hereby from image data. An anomaly of volume changes near the solidus temperature is visible. Viscosity and surface tension were determined by the oscillating drop technique using optic and electronic data. It was observed that the alloying of Si into Ge increases the surface tension of the melts. The viscosity is following an Arrhenius equation and shows a crossover temperature which separates simple liquid at high temperatures from cooperative liquid at low temperatures.
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