Reactive Deposition of Al2O3 Coatings by Thermal Evaporation in a High-Current Discharge with a Hollow Anode

被引：0
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作者：
A. S. Kamenetskikh
N. V. Gavrilov
Yu. S. Surkov
P. V. Tretnikov
A. V. Chukin
机构：
[1] Institute of Electrophysics,
[2] Ural Branch,undefined
[3] Russian Academy of Science,undefined
[4] Ural Federal University,undefined
来源：
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques | 2020年 / 14卷
关键词：
α-Al; O; low-pressure gas discharge; anodic thermal evaporation; nanocrystalline coatings; high-rate deposition; ion assistance; XRD;
D O I：
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学科分类号：
摘要：
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页码：85 / 91
页数：6
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