Fabrication and Characterization of a p-AgO/PSi/n-Si Heterojunction for Solar Cell Applications

被引：0
|
作者：
Nadir F. Habubi
Ahmed N. Abd
Mohammed O. Dawood
A. H. Reshak
机构：
[1] University of Al- Mustansiriyah,Physics Department, Education Faculty
[2] University of Al- Mustansiriyah,Physics Department, Science Faculty
[3] University of West Bohemia,New Technologies
[4] University Malaysia Perlis, Research Centre
来源：
Silicon | 2018年 / 10卷
关键词：
AgO; Thermal oxidation; Lifetime; Heterodiode; XRD; AFM; SEM;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
A p-AgO/PSi/n-Si heterojunction was deposited by high vacuum thermal evaporation of silver subjected to thermal oxidation at 300 ∘C on porous silicon. Surface morphology and electrical properties of this structure have been studied. The X-ray diffraction (XRD) analysis reveals that the peaks at the (220) and (111) planes were dominated for the crystal quality of the AgO films. The band gap of the AgO films was found to be 2.2 eV and 3.2 eV . The positive sign of Hall effect confirms that the film was of p-type conductivity. The average grain size of pore was measured from the atomic force microscope (AFM) analysis and found to be around 32 nm. The responsivity photodetector after deposited AgO have revealed increasing in response.
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页码：371 / 376
页数：5
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