Modification of Textile Materials with Nanoparticles Using Low-Pressure High-Frequency Plasma

被引：1
|
作者：
Timoshina Y.A. [1 ]
Trofimov A.V. [1 ]
Miftakhov I.S. [1 ]
Voznesenskii E.F. [1 ]
机构：
[1] Kazan National Research Technological University, Kazan
来源：
Nanotechnologies in Russia | 2018年 / 13卷 / 11-12期
关键词：
D O I：
10.1134/S1995078018060101
中图分类号：
学科分类号：
摘要：
Abstract: The possibility of modifying the surface of textile fibers with inorganic nanoparticles is experimentally established. The processes of fixing silver nanoparticles on the surface of nonwoven materials based on polypropylene fibers with preliminary modification in plasma of a high-frequency (HF) capacitive discharge of low pressure in order to impart stable antibacterial properties are studied. The processes of glass-fabric modification with the simultaneous deposition of silicon dioxide nanoparticles under plasma conditions of a low-pressure HF induction discharge to achieve the effects of adjustable wettability are considered. © 2018, Pleiades Publishing, Ltd.
引用
收藏
页码：561 / 564
页数：3
相关论文
共 50 条
  • [1] Research on adhesive joints of textile materials modified by flux of high-frequency low-pressure plasma
    Kumpan E.V.
    Abdullin I.S.
    Khammatova V.V.
    Polymer Science Series D, 2012, 5 (1) : 46 - 48
  • [2] PENETRATION OF A HIGH-FREQUENCY FIELD IN A LOW-PRESSURE PLASMA
    KOFOID, MJ
    CLEVA, HV
    PHYSICS OF FLUIDS, 1969, 12 (06) : 1279 - &
  • [3] Surface Modification of Si Wafer by Low-Pressure High-Frequency Plasma Chemical Vapor Deposition Method
    Yuji, Toshifumi
    Mungkung, Narong
    Kiyota, Yuichi
    Uesugi, Daishiro
    Kawano, Minobu
    Nakabayashi, Kenichi
    Kataoka, Hisaaki
    Suzaki, Yoshifumi
    Kashihara, Nobuki
    Akatsuka, Hiroshi
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2011, 39 (06) : 1427 - 1431
  • [4] Surface Modification of Silicon Wafer by Low-Pressure High-frequency Plasma Chemical Vapor Deposition Method
    Kataoka, H.
    Mungkung, N.
    Yuji, T.
    Kawano, M.
    Kiyota, Y.
    Uesugi, D.
    Nakabayashi, K.
    Suzaki, Y.
    Shibata, H.
    Kashihara, N.
    Sakai, K.
    Bouno, T.
    Akatsuka, H.
    ISDEIV 2010: XXIVTH INTERNATIONAL SYMPOSIUM ON DISCHARGES AND ELECTRICAL INSULATION IN VACUUM, 2010, : 504 - 507
  • [5] Effects of a high-frequency low-pressure plasma on the properties of titanium alloys
    Matukhnov, V.M.
    Abdullin Sh., I.
    Altareva, G.I.
    Biomedical Engineering, 1985, 19 (01) : 25 - 29
  • [6] Development of low-pressure high-frequency plasma chemical vapor deposition method on surface modification of silicon wafer
    Thungsuk, Nuttee
    Nuchuay, Peerapong
    Hirotani, Daisuke
    Okamura, Yoshimi
    Nakabayashi, Kenichi
    Kinoshita, Hiroyuki
    Yuji, Toshifumi
    Mungkung, Narong
    Kasayapanand, Nat
    VACUUM, 2014, 109 : 166 - 169
  • [7] DEGREE OF DISSOCIATION AND TEMPERATURE OF NEUTRAL GAS IN HIGH-FREQUENCY LOW-PRESSURE PLASMA
    VEPREK, S
    KOCIAN, P
    HELVETICA PHYSICA ACTA, 1973, 46 (04): : 447 - 451
  • [8] ACTION OF THE PLASMA OF A STEADY HIGH-FREQUENCY LOW-PRESSURE DISCHARGE ON A POLYETHYLENE SURFACE
    VASILETS, VN
    TIKHOMIROV, LA
    PONOMAREV, AN
    HIGH ENERGY CHEMISTRY, 1981, 15 (01) : 64 - 67
  • [9] STUDY OF HIGH-FREQUENCY CAPACITY LOW-PRESSURE DISCHARGE
    DULKIN, AE
    MOSHKALEV, SA
    SMIRNOV, AS
    FROLOV, KS
    ZHURNAL TEKHNICHESKOI FIZIKI, 1993, 63 (07): : 64 - 73
  • [10] PREPARATION OF DIELECTRIC FILMS FROM HEXAMETHYLCYCLOTRISILAZANE IN HIGH-FREQUENCY LOW-PRESSURE DISCHARGE PLASMA
    SMIRNOVA, TP
    RUMYANTSEV, YM
    FAYNER, NI
    AKKERMAN, ZL
    SYSOEVA, NP
    IZVESTIYA SIBIRSKOGO OTDELENIYA AKADEMII NAUK SSSR SERIYA KHIMICHESKIKH NAUK, 1989, (03): : 52 - 56
12345