Improvements of MCT MBE Growth on GaAs

被引:0
|
作者
J. Ziegler
J. Wenisch
R. Breiter
D. Eich
H. Figgemeier
P. Fries
H. Lutz
R. Wollrab
机构
[1] AIM Infrarot-Module GmbH,
来源
关键词
Infrared detectors; HgCdTe; MCT; IR-FPA; MBE; GaAs substrates;
D O I
暂无
中图分类号
学科分类号
摘要
In recent years, continuous progress has been published in the development of HgCdTe (MCT) infrared (IR) focal plane arrays (FPAs) fabricated by molecular beam epitaxy on GaAs substrates. In this publication, further characterization of the state-of-the art 1280 × 1024 pixel, 15-μm pitch detector fabricated from this material in both the mid-wavelength (MWIR) and long-wavelength (LWIR) IR region will be presented. For MWIR FPAs, the percentage of defective pixel remains below 0.5% up to an operating temperature (TOP) of around 100 K. For the LWIR FPA, an operability of 99.25% was achieved for a TOP of 76 K. Additionally, the beneficial effect of the inclusion of MCT layers with a graded composition region was investigated and demonstrated on current–voltage (IV) characteristics on test diodes in a MWIR FPA.
引用
收藏
页码:2935 / 2940
页数:5
相关论文
共 50 条
  • [1] Improvements of MCT MBE Growth on GaAs
    Ziegler, J.
    Wenisch, J.
    Breiter, R.
    Eich, D.
    Figgemeier, H.
    Fries, P.
    Lutz, H.
    Wollrab, R.
    JOURNAL OF ELECTRONIC MATERIALS, 2014, 43 (08) : 2935 - 2940
  • [2] MBE Growth of MCT on GaAs Substrates at AIM
    J. Wenisch
    D. Eich
    H. Lutz
    T. Schallenberg
    R. Wollrab
    J. Ziegler
    Journal of Electronic Materials, 2012, 41 : 2828 - 2832
  • [3] MBE Growth of MCT on GaAs Substrates at AIM
    Wenisch, J.
    Eich, D.
    Lutz, H.
    Schallenberg, T.
    Wollrab, R.
    Ziegler, J.
    JOURNAL OF ELECTRONIC MATERIALS, 2012, 41 (10) : 2828 - 2832
  • [4] DRASTIC MORPHOLOGICAL IMPROVEMENTS IN GAAS GROWTH ON UNDERCUT MESA STRIPES BY MBE
    TAKAMORI, T
    WATANABE, K
    KAMIJOH, T
    ELECTRONICS LETTERS, 1992, 28 (24) : 2207 - 2209
  • [5] MCT by MBE on GaAs at AIM: State of the Art and Roadmap
    Figgemeier, H.
    Wenisch, J.
    Eich, D.
    Hanna, S.
    Schirmacher, W.
    Lutz, H.
    Schallenberg, T.
    Breiter, R.
    INFRARED TECHNOLOGY AND APPLICATIONS XLI, 2015, 9451
  • [6] THE GROWTH OF GAAS ON SI BY MBE
    KOCH, SM
    ROSNER, SJ
    HULL, R
    YOFFE, GW
    HARRIS, JS
    JOURNAL OF CRYSTAL GROWTH, 1987, 81 (1-4) : 205 - 213
  • [7] ELEMENTARY PROCESSES IN THE MBE GROWTH OF GAAS
    JOYCE, BA
    SHITARA, T
    YOSHINAGA, A
    VVEDENSKY, DD
    NEAVE, JH
    ZHANG, J
    APPLIED SURFACE SCIENCE, 1992, 60-1 : 200 - 209
  • [8] GROWTH AND CHARACTERIZATION OF GAAS ON SI BY MBE
    LI, AZ
    WANG, JX
    QIU, JH
    LIANG, BW
    ZHENG, YL
    WANG, SB
    III-V HETEROSTRUCTURES FOR ELECTRONIC / PHOTONIC DEVICES, 1989, 145 : 305 - 309
  • [9] Growth dynamics of InGaAs/GaAs by MBE
    Georgia Inst of Technology, Atlanta, United States
    J Cryst Growth, pt 1 (203-210):
  • [10] Growth dynamics of InGaAs/GaAs by MBE
    Fournier, F
    Metzger, RA
    Doolittle, A
    Brown, AS
    CarterComan, C
    Jokerst, NM
    BicknellTassius, R
    JOURNAL OF CRYSTAL GROWTH, 1997, 175 : 203 - 210