Surface analysis of reactive sputtered Pb(Zr,Ti)O3 thin films by XPS

被引：3
|
作者：
Suchaneck, G. [1 ]
Lin, Wen-Mei
Gerlach, G.
Kislova, I. L.
机构：
[1] Tech Univ Dresden, INst Festkorperelektroni, D-01062 Dresden, Germany
[2] Tver State Univ, Dept Ferroelect & Piezoelect Phys, Tver 170002, Russia
来源：
FERROELECTRICS | 2007年 / 353卷
关键词：
ferroelectric thin films; sputter deposition; X-ray photoelectron spectroscopy;
D O I：
10.1080/00150190701368083
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this work, the chemical composition profile near the stuface of Pb(ZrTi)O-3 thin films which were deposited by large-area multi-target reactive sputtering was investigated by nondestructive angle-resolved X-ray photoelectron spectroscopy. We obtained a lead depleted stuface layer with an increased ZrI(Zr+Ti) ratio compared to the film bulk. The presence of this damaged surface layer was attributed to ion bombardment from the low-pressure plasma at the sputter target. This stuface layer was found to absorb oxygen and moisturefirom the environment.
引用
收藏
页码：566 / 571
页数：6
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