The effect of a post-treatment of amorphous carbon films with high energy ion beams

被引：0
|
作者：
Kolitsch, A [1 ]
Richter, E [1 ]
Drummer, H [1 ]
Roland, U [1 ]
Ullmann, J [1 ]
机构：
[1] ROSSENDORF INC,RES CTR,INST ION BEAM PHYS & MAT RES,D-01314 DRESDEN,GERMANY
来源：
ION BEAM MODIFICATION OF MATERIALS | 1996年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：511 / 516
页数：6
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