Cavity-hollow cathode-sputtering source for titanium films

被引：6

作者：

Schrittwieser, R. ^{[1
]}

Ionita, C. ^{[1
]}

Murawski, A. ^{[1
]}

Maszl, C. ^{[1
]}

Asandulesa, M. ^{[2
]}

Nastuta, A. ^{[2
]}

Rusu, G. ^{[2
]}

Douat, C. ^{[3
]}

Olenici, S. B. ^{[4
]}

Vojvodic, I. ^{[5
]}

Dobromir, M. ^{[2
]}

Luca, D. ^{[2
]}

Jaksch, S. ^{[1
]}

Scheier, P. ^{[1
]}

机构：

[1] Univ Innsbruck, Inst Ion Phys & Appl Phys, A-6020 Innsbruck, Austria

[2] Alexandru Ioan Cuza Univ, Fac Phys, Iasi, Romania

[3] Univ Paris 11, UFR Sci, Orsay, France

[4] ISAS Inst Analyt Sci, Dortmund, Germany

[5] Univ Montenegro, Fac Nat Sci & Math, Podgorica, Montenegro

来源：

JOURNAL OF PLASMA PHYSICS | 2010年 / 76卷

基金：

奥地利科学基金会;

关键词：

DISCHARGE PLASMA; DEPOSITION; ELECTRON; SYSTEM; DIAGNOSIS; CLUSTERS; PROBE; IONS;

D O I：

10.1017/S0022377809990900

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

A cavity-hollow cathode was investigated as low-cost sputtering source for titanium. An argon discharge is produced inside a hollow cathode consisting of two specifically formed disks of titanium. An additional cavity further enhances the pendulum effect of the electrons. Measurements with small Langmuir probes yielded evidence for the formation of a space charge double layer above the cathode. The sputtered atoms form negatively charged clusters. After further acceleration by the double layer the clusters impinge on the substrates. Titanium thin films were produced on highly oriented pyrolytic graphite. The films were investigated by a scanning tunnel microscope and X-ray photoelectron spectroscopy.

引用

页码：655 / 664

页数：10

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