Elevated rate growth of nanolayers of Cr and CrSi2 on Si(111)

被引：0
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作者：
Plusnin, NI [1 ]
Milenin, AP [1 ]
Iliyashenko, BM [1 ]
Lifshits, VG [1 ]
机构：
[1] Russian Acad Sci, Far Eastern Branch, Inst Automat & Control Proc, Vladivostok 690041, Russia
来源：
PHYSICS OF LOW-DIMENSIONAL STRUCTURES | 2002年 / 9-10卷
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O59 [应用物理学];
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页码：129 / 145
页数：17
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