2D silicon-based photonic crystals

被引：0
|
作者：
Sin, Y. K. [1 ]
Ibrahim, K. [1 ]
机构：
[1] Univ Sains Malaysia, Sch Phys, Nanooptoelect Res & Technol Lab, Minden 11800, Pulau Pinang, Malaysia
来源：
2006 IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS, PROCEEDINGS | 2006年
关键词：
D O I：
10.1109/SMELEC.2006.381055
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In the present paper, fabrication of a silicon-based two-dimensional photonic crystal based on electron beam lithography (EBL) and reactive ion etching (RIE) was demonstrated. In addition the structural color of fabricated crystal was obtained with a simple experimental setup consisted of a light source and a digital camera. From the result, the structural color of PhCs was underlying on the concept of reflection grating.
引用
收藏
页码：236 / +
页数：3
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