Recombination Kinetics and Effects of Superacid Treatment in Sulfur- and Selenium-Based Transition Metal Dichalcogenides

被引:244
|
作者
Amani, Matin [1 ,2 ]
Taheri, Peyman [1 ]
Addou, Rafik [3 ]
Ahn, Geun Ho [1 ,2 ]
Kiriya, Daisuke [1 ,2 ]
Lien, Der-Hsien [1 ,2 ]
Ager, Joel W., III [2 ]
Wallace, Robert M. [3 ]
Jayey, Ali [1 ,2 ]
机构
[1] Univ Calif Berkeley, Elect Engn & Comp Sci, Berkeley, CA 94720 USA
[2] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
[3] Univ Texas Dallas, Dept Mat Sci & Engn, Richardson, TX 75080 USA
关键词
Transition metal dichalcogenide; quantum yield; radiative lifetime; biexcitonic recombination; PHOTOLUMINESCENCE QUANTUM YIELD; VALLEY POLARIZATION; MONOLAYER MOS2; DEFECTS; WS2; TRANSISTORS; TRANSPORT; STRAIN; GROWTH; STATES;
D O I
10.1021/acs.nanolett.6b00536
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Optoelectronic devices based on two-dimensional (2D) materials have shown tremendous promise over the past few years; however, there are still numerous challenges that need to be overcome to enable their application in devices. These include improving their poor photoluminescence (PL) quantum yield (QY) as well as better understanding of exciton-based recombination kinetics. Recently, we developed a chemical treatment technique using an organic superacid, bis(trifluoromethane)sulfonimide (TFSI), which was shown to improve the quantum yield in MoS2 from less than 1% to over 95%. Here, we perform detailed steady-state and transient optical characterization on some of the most heavily studied direct bandgap 2D materials, specifically WS2, MoS2, WSe2, and MoSe2, over a large pump dynamic range to study the recombination mechanisms present in these materials. We then explore the effects of TFSI treatment on the PL QY and recombination kinetics for each case. Our results suggest that sulfur-based 2D materials are amenable to repair/passivation by TFSI, while the mechanism is thus far ineffective on selenium based systems. We also show that biexcitonic recombination is the dominant nonradiative pathway in these materials and that the kinetics for TFSI treated MoS2 and WS2 can be described using a simple two parameter model.
引用
收藏
页码:2786 / 2791
页数:6
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