Application of a Potential Profile for Controlling the Beam Laminarity in a Magnetron Injection Gun

被引:0
|
作者
Yamaguchi, Y. [1 ]
Tatematsu, Y. [1 ]
Saito, T. [1 ]
Ikeda, R. [1 ]
Ogawa, I. [1 ]
Idehara, T. [1 ]
机构
[1] Univ Fukui, Res Ctr Dev Far Infrared Reg, Fukui 9108507, Japan
关键词
GYROTRON;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A method is described to form a laminar electron beam for a high power gyrotron. An optimum potential profile is investigated to adjust each electron trajectory in between cathode and 1st anode. A high quality laminar beam is realized with a wide operation window.
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页数:2
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