Growth and structural properties of Mg:C thin films prepared by magnetron sputtering

被引:17
|
作者
Ingason, A. S. [1 ]
Eriksson, A. K. [1 ]
Lewin, E. [2 ]
Jensen, J. [3 ]
Olafsson, S. [1 ]
机构
[1] Univ Iceland, Inst Sci, IS-107 Reykjavik, Iceland
[2] Uppsala Univ, Dept Chem Mat, Angstrom Lab, SE-751 Uppsala, Sweden
[3] IFM Linkoping Univ, Dept Phys Chem & Biol, Film Phys Div, SE-58183 Linkoping, Sweden
关键词
Magnesium; Carbon; In-situ resistance measurements; X-ray photoelectron spectroscopy; Magnetron sputtering; X-ray diffraction; Elastic recoil detection analysis; HYDROGEN ABSORPTION; CRYSTAL-STRUCTURE; MAGNESIUM;
D O I
10.1016/j.tsf.2009.12.082
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate the growth and structure properties of Mg:C thin films. The films are prepared using a dc magnetron sputtering discharge where the electrical resistance over the films is monitored during growth in-situ with a four point probe setup. The structural properties of the films are investigated using X-ray diffraction measurements and the elemental composition and binding in the films is determined using elastic recoil detection analysis and X-ray photoelectron spectroscopy. The results show that during co-sputtering the carbon flux influences the initial stages of the film growth. The films are made of polycrystalline magnesium grains embedded in a carbon network, the size of which depends on the carbon content, but amorphous phases cannot be excluded. The XPS measurements show the presence of carbidic carbon whereas X-ray measurements find no Mg:C phases. The overall stability of the films is found to depend on the carbon content, where stable films capped with a 14 nm Pd layer cannot be obtained with carbon content above 18%. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:4225 / 4230
页数:6
相关论文
共 50 条
  • [1] Structural and mechanical properties of CNx thin films prepared by magnetron sputtering
    Kurt, R
    Sanjines, R
    Karimi, A
    Lévy, F
    DIAMOND AND RELATED MATERIALS, 2000, 9 (3-6) : 566 - 572
  • [2] Structural and electrical properties of CuAlMo thin films prepared by magnetron sputtering
    Birkett, Martin
    Penlington, Roger
    Wan, Chaoying
    Zoppi, Guillaume
    THIN SOLID FILMS, 2013, 540 : 235 - 241
  • [3] Structural and optical properties of the SiCN thin films prepared by reactive magnetron sputtering
    Peng, Yinqiao
    Zhou, Jicheng
    Zhao, Baoxing
    Tan, Xiaochao
    Zhang, Zhichao
    APPLIED SURFACE SCIENCE, 2011, 257 (09) : 4010 - 4013
  • [4] Electrical and structural properties of zirconia thin films prepared by reactive magnetron sputtering
    Hembram, K. P. S. S.
    Dutta, Gargi
    Waghmare, Umesh V.
    Rao, G. Mohan
    PHYSICA B-CONDENSED MATTER, 2007, 399 (01) : 21 - 26
  • [5] Structural, electrical and transparent properties of ZnO thin films prepared by magnetron sputtering
    Lee, J
    Li, Z
    Hodgson, M
    Metson, J
    Asadov, A
    Gao, W
    CURRENT APPLIED PHYSICS, 2004, 4 (2-4) : 398 - 401
  • [6] Structural properties of TiN thin films prepared by RF reactive magnetron sputtering
    Dhanaraj, R.
    Mohamed, S. B.
    Kamruddin, M.
    Kaviyarasu, K.
    Manojkumar, P. A.
    MATERIALS TODAY-PROCEEDINGS, 2021, 36 : 146 - 149
  • [7] Properties of MoOx thin films prepared by magnetron sputtering
    Wang Xiao-kun
    Fang Wei-hua
    Liu Fei
    CHINESE JOURNAL OF LIQUID CRYSTALS AND DISPLAYS, 2020, 35 (03) : 211 - 218
  • [8] Al-Mg-B thin films prepared by magnetron sputtering
    Wu, Zhanling
    Bai, Yizhen
    Qu, Wenchao
    Wu, Aimin
    Zhang, Dong
    Zhao, Jijun
    Jiang, Xin
    VACUUM, 2010, 85 (04) : 541 - 545
  • [9] Structural and optical properties of yttrium trioxide thin films prepared by RF magnetron sputtering
    Yan, F.
    Liu, Z. T.
    Liu, W. T.
    VACUUM, 2011, 86 (01) : 72 - 77
  • [10] Electrical and structural properties of the Ta/Ag thin films prepared by DC magnetron sputtering
    Moazzen, M. A. Moghri
    Taiebyzadeh, P.
    Borghei, S. M.
    FRONTIERS IN THEORETICAL AND APPLIED PHYSICS/UAE 2017 (FTAPS 2017), 2017, 869