170 keV Proton radiation effects on low-frequency noise of bipolar junction transistors

被引:2
|
作者
Yue, Long [1 ]
Yang, Shaohua [1 ]
Liu, Yuan [1 ]
Zhang, Zhangan [1 ]
Li, Xingji [2 ]
He, Yujuan [1 ]
Lei, Zhifeng [1 ]
Lu, Yudong [1 ]
En, Yunfei [1 ]
机构
[1] Minist Ind & Informat Technol, Sci & Technol Reliabil Phys & Applicat Elect Comp, Elect Res Inst 5, Guangzhou, Guangdong, Peoples R China
[2] Harbin Inst Technol, Sch Mat Sci & Engn, Harbin, Peoples R China
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 2017年 / 172卷 / 3-4期
基金
中国国家自然科学基金;
关键词
Proton radiation; displacement damage; bipolar junction transistor; low-frequency noise; HYDROGEN; IONS; DLTS;
D O I
10.1080/10420150.2017.1313843
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
In this paper, the electrical properties and low-frequency noise for bipolar junction transistors irradiated by 170 keV proton are examined. The result indicates that for the sample under proton irradiation with fluence 1.25x10(14) p/cm(2), base current I-B in low bias range (V-BE < 0.7 V) increases due to superimposition of radiation-induced recombination current, while the gain decreases significantly. Meanwhile, the low-frequency noise increases in the proton-irradiated sample. By analysis of evolution of parameters extracted from low-frequency noise power spectra, it is demonstrated that radiation-induced noise is mainly originated from carrier fluctuation modulated by generation-recombination centers (G-R centers) located at the interface of Si/SiO2, which are introduced by proton-radiation-induced defects. It is also confirmed that the electrical properties and noise behavior of irradiated sample are mostly affected by the carrier recombination process caused by G-R centers at the interface of Si/SiO2 than by G-R centers in EB junctions.
引用
收藏
页码:313 / 322
页数:10
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