Electron energy loss spectroscopy in the 2-5 eV regime

被引:0
|
作者
Bangert, U [1 ]
Harvey, A
Keyse, R
Dieker, C
机构
[1] Univ Manchester, Dept Phys, Manchester M60 1QD, Lancs, England
[2] Univ Liverpool, Dept Mat Sci & Engn, Liverpool L69 3BX, Merseyside, England
[3] Forschungszentrum Julich, Inst Schicht & Ionentech, D-52425 Julich, Germany
来源
ELECTRON MICROSCOPY AND ANALYSIS 1997 | 1997年 / 153期
关键词
D O I
暂无
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Localized electron energy loss Spectroscopy (EELS) studies in the bandgap energy regime were conducted in the GaN/3C-SiC and GaAlInP/GaAs materials systems. Requirements on experimental conditions and data analysis using the VG601UX and the possible interferences arising from instrumental factors and Cerenkov radiation losses are addressed. The bandgap of GaAs can be determined after subtraction of the zero loss peak. This procedure is, however, proned to introduce inaccuracies: GaAlInP shows deviations from the expected bandgap value of 0.5 eV. Materials not requiring subtraction of the zero loss peak fare better: the bandgap values of 3.3 and 3.1 eV obtained for GaN tie in with those obtained from Photoluminescence spectra for hexagonal and cubic GaN. Variations in the midgap states density vary with the location in the film and can be related to the amount of microstructural defects.
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页码:273 / 276
页数:4
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