Contact Stress Analysis of NCD Coating on Cemented Carbide

被引：0

作者：

Yuan, Jiajing ^{[1
]}

Lu, Wenzhuang ^{[1
]}

Zuo, Dunwen ^{[1
]}

Xu, Feng ^{[1
]}

机构：

[1] Nanjing Univ Aeronaut & Astronaut, Coll Mech & Elect Engn, Nanjing 210016, Peoples R China

来源：

MACHINING AND ADVANCED MANUFACTURING TECHNOLOGY X | 2010年 / 431-432卷

关键词：

NCD film; Contact analysis; Shear stress; FEM; DIAMOND FILM; SUBSTRATE; ADHESION;

D O I：

10.4028/www.scientific.net/KEM.431-432.98

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

The contact stress of cemented carbide with NCD coating in elastic contact was analyzed using ANSYS. Factors such as elastic modulus and thickness of NCD film and elastic modulus of interlayer which affect the shear stress distribution of NCD film on cemented carbide substrate were investigated. The results show that the maximum shear stress point moves towards the interface with the increase of film elastic modulus. Film thickness has a significant effect on shear stress distribution of NCD film. High shear stress develops in the film layer with the increase of film thickness. Interlayer with low elastic modulus will cause shear stress concentration in NCD film.

引用

页码：98 / 101

页数：4

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