Visualization of the microscopic flow profile of state-of-the-art absorption heat pump working pairs under operational conditions

被引:4
|
作者
Emhofer, Johann [1 ]
Fleckl, Thomas [1 ]
机构
[1] Austrian Inst Technol, Dept Energy, A-1210 Vienna, Austria
关键词
Falling film; Absorption heat pump; Absorption chiller; PIV; PTV; Velocity profiles; LiBr/water; MASS-TRANSFER; PARTICLE TRACKING;
D O I
10.1016/j.applthermaleng.2014.07.026
中图分类号
O414.1 [热力学];
学科分类号
摘要
The research and development of novel working pairs and highly efficient heat exchangers for absorption heat pump applications require a detailed analysis of the microscopic flow profile at the absorber heat exchanger during the absorption process. A recently developed Single Aperture Defocussing Micro Particle Tracking method, based on a conventional Particle Image Velocimetry system, demonstrates the possibility of simultaneous measurements of velocity profiles and film thicknesses in falling film absorbers at steady-state flows. We show first results of velocity profile measurements of the state-of-the-art working pair LiBr/water, with and without a 2-Ethyl-1-Hexanol additive, during operation in a lab-scale absorption heat pump. Based on the results of the measurements, the advantages and disadvantages of the developed measurement technique and their potential application in the characterization of novel working pairs is discussed. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码:66 / 73
页数:8
相关论文
共 3 条
  • [1] CHECK VALVE BEHAVIOR UNDER TRANSIENT FLOW CONDITIONS - A STATE-OF-THE-ART REVIEW
    THORLEY, ARD
    JOURNAL OF FLUIDS ENGINEERING-TRANSACTIONS OF THE ASME, 1989, 111 (02): : 178 - 183
  • [2] Vertical U-pipe flow characteristics in absorption heat pump: Experimental study under vacuum conditions
    Zhu, Chaoyi
    Xie, Xiaoyun
    Jiang, Yi
    APPLIED THERMAL ENGINEERING, 2020, 172
  • [3] On-line Corrosion Monitoring of 70 Cu 30 Ni Alloy in a LiBr Solution under Absorption Heat Pump Flow Conditions
    Urzua, R.
    Siqueiros, J.
    Morales, L.
    Rosales, I.
    Uruchurtu, J.
    PORTUGALIAE ELECTROCHIMICA ACTA, 2009, 27 (02) : 127 - 142